According to Zhitong Finance App News, Qingyi Optoelectronics (688138.SH) disclosed the development progress of high-end semiconductor mask versions. As of the announcement disclosure date, the company's 55nm PSM (phase shift mask version) products had signed a confidentiality agreement with the customer and confirmed product specifications. The product has now been delivered and has entered the customer's online certification stage. PSM phase shift mask is mainly used as a key lithography layer requiring high graphics accuracy in semiconductor chip manufacturing. It covers high-precision graphics scenarios such as logic, storage, some characteristic processes and power devices. It can improve lithography resolution, improve graphic contrast, and broaden the lithography process window. It is an important product for the company's semiconductor mask business to break through to higher process nodes.

According to Zhitong Finance App News, Qingyi Optoelectronics (688138.SH) disclosed the development progress of high-end semiconductor mask versions. As of the announcement disclosure date, the company's 55nm PSM (phase shift mask version) products had signed a confidentiality agreement with the customer and confirmed product specifications. The product has now been delivered and has entered the customer's online certification stage. PSM phase shift mask is mainly used as a key lithography layer requiring high graphics accuracy in semiconductor chip manufacturing. It covers high-precision graphics scenarios such as logic, storage, some characteristic processes and power devices. It can improve lithography resolution, improve graphic contrast, and broaden the lithography process window. It is an important product for the company's semiconductor mask business to break through to higher process nodes.