ASML and TSMC Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High NA EUV

ASML and TSMC Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High NA EUV

HSINCHU, Taiwan, R.O.C. and VELDHOVEN, the Netherlands – September 8, 2026 – Taiwan Semiconductor Manufacturing Company (TWSE: 2330, NYSE: TSM) and ASML Holding N.V. (Euronext: ASML, Nasdaq: ASML) announced a collaborative initiative to lead the semiconductor industry’s transition to a larger-format Extreme Ultraviolet (EUV) lithography photomask.